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Arai, T. Electron attachment to atomic hydrogen on the surface of liquid $E bold {nothing sup 4 roman He} [Text] !Otitkn.pft: FILE NOT FOUND! !oizd.pft: FILE NOT FOUND! !ospec.pft: FILE NOT FOUND! !oistaspk_H.pft: FILE NOT FOUND! Рубрикатор НБУВ: Тематичні рубрики:
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Анотація: We demonstrate a possibility that helium surface electrons at cryogenic temperatures can be used as a new source of very low energy electrons. Since both electrons ($E roman e sup -) and hydrogen atoms (H) are bound on liquid helium surface, two-dimensional mixture gas of these two species is available on the surface. We found that low energy collision of $E roman e sup - and H drives electron attachment to form a negative hydrogen ion ($E roman H sup -) in the mixture. From our temperature dependence measurement of the reaction rate, it was found that another H atom participate in the reaction. Namely, the reaction is expressed as $E roman {H~+~H~+~e sup - ~symbol О~H sup -~+~H}. Possible reaction mechanisms are discussed in terms of direct three-body process and dissociative attachment process. Measurements in applied magnetic field (IBD) show that the reaction rate coefficient is suppressed as ~ $E B sup -2. This implies that electron spin singlet collision is relevant for electron attachment. !oprip481_H.pft: FILE NOT FOUND! Дод. точки доступу: Yayama, H. ; Kono, K.
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