Bortchagovsky, E. G.
Direct synthesized graphene-like film on SiOsub2/sub: mechanical and optical properties [] !Otitkn.pft: FILE NOT FOUND! !oizd.pft: FILE NOT FOUND! !ospec.pft: FILE NOT FOUND! !oistaspk_H.pft: FILE NOT FOUND!

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Кл.слова (ненормированные):
directly grown graphene on SiO2 -- chemical vapor deposition -- micro-Raman -- AFM -- spectroscopic ellipsometry
Анотація: Exploiting CVD technique for carbon deposition from C2H2 + H2 + N2 mixture, a graphene-like film synthesized directly on SiO2 surface of Si2 - Si structure was obtained. The graphene-like film was grown under thin Ni layer that is easy exfoliated from graphene-Si2 - Si structure. Surface of the film was sufficiently smooth and reveals no winkles and holes; it has a good homogeneity and perfect adhesion to SiO2 layer. Studying the micro-Raman spectra showed a graphene-like structure of the film; using atomic force microscopic technique, the thickness of film was determined (0,6 nm). Using spectroscopic ellipsometry and simple Cauchy model enabled us to estimate optical parameters of this graphene-like film. !oprip481_H.pft: FILE NOT FOUND!

Дод. точки доступу:
Vasin, A. V.; Lytvyn, P. M.; Tiagulskyi, S. I.; Slobodian, A. M.; Verovsky, I. N.; Strelchuk, V. V.; Stubrov, Yu.; Nazarov, A. N.