The simulation of the absorbed dose distribution into thin films with different thickness inserted between flat boundaries of two homogeneous materials as well as the absorbed dose distribution near to boundaries of these materials irradiated with a scanned electron beam were fulfilled. Films inserted in multi-layer targets were parallel orientated with an incident electron beam (EB). The simulation was performed by the Monte Carlo method with utilization of the software ModePEB which was designed for predictions of a dose distribution in heterogeneous targets irradiated by EB with the electron energy range from 0,1 to 25 MeV. Comparison results of MC simulation with dosimetry for electron dose distribution formation in multi-layer targets with thin films is discussed.

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